Ion Implantation and Synthesis of Materials PDF Download. Download free ebook of Ion Implantation and Synthesis of Materials in PDF format or read online by Michael Nastasi,James W. Mayer 9783540452980 Published on 2007-05-16 by Springer Science & Business Media
Ion implantation is one of the key processing steps in silicon integrated circuit technology. Some integrated circuits require up to 17 implantation steps and circuits are seldom processed with less than 10 implantation steps. Controlled doping at controlled depths is an essential feature of implantation. Ion beam processing can also be used to improve corrosion resistance, to harden surfaces, to reduce wear and, in general, to improve materials properties. This book presents the physics and materials science of ion implantation and ion beam modification of materials. It covers ion-solid interactions used to predict ion ranges, ion straggling and lattice disorder. Also treated are shallow-junction formation and slicing silicon with hydrogen ion beams. Topics important for materials modification, such as ion-beam mixing, stresses, and sputtering, are also described.
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Book ID of Ion Implantation and Synthesis of Materials's Books is fjSOL9MHBVoC, Book which was written by Michael Nastasi,James W. Mayer have ETAG "cDCoTeclGPc"
Book which was published by Springer Science & Business Media since 2007-05-16 have ISBNs, ISBN 13 Code is 9783540452980 and ISBN 10 Code is 3540452982
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